---
title: "Fermi level with 10¹⁰ Sb then 2×10¹⁵ B"
subject: "Electrical Engineering Material"
chapter: 6
key: "semester_3/electrical_engineering_material:antimony-1e10-boron-2e15"
source: https://www.bctengineer.com/q/semester_3/electrical_engineering_material/antimony-1e10-boron-2e15
site: BCT Engineering
---

# Fermi level with 10¹⁰ Sb then 2×10¹⁵ B

Electrical Engineering Material · Chapter 6: Semiconductors

- Asked in: 2069 Chaitra, 6 marks
- Video: [Fermi Energy Level in Intrinsic and Extrinsic Semiconductors](https://www.youtube.com/watch?v=SxLX65vVMtg) — Ekeeda
- Answer checked by Claude Opus 5.5 (high effort) on 2026-10-14
- Page: https://www.bctengineer.com/q/semester_3/electrical_engineering_material/antimony-1e10-boron-2e15
- Whole chapter: https://www.bctengineer.com/md/semester_3/electrical_engineering_material/chapter-6

## Question

An n-type silicon wafer is uniformly doped with 10¹⁰ antimony atoms per cm³. Where will be the Fermi level compared to its intrinsic Fermi level? Where will the Fermi level be shifted if the sample is further doped with 2×10¹⁵ boron atoms per cm³?

## Short answer

With 10^10 cm⁻³ Sb (Nd < ni), solving n = (Nd/2)+√[(Nd/2)²+ni²] gives n≈2.03×10^10 cm⁻³, so EF − Ei = 0.0087 eV. After adding 2×10^15 cm⁻³ B, net p ≈ 2×10^15 cm⁻³ (p-type), and Ei − EF = 0.306 eV.

## Answer

Take $T = 300$ K, $kT = 0.02586$ eV and $n_i = 1.45\times10^{10}$ cm⁻³ for Si. Fermi level positions are measured from the intrinsic Fermi level $E_{Fi}$.

#### Part 1: Only $N_d = 10^{10}$ cm⁻³ antimony
Here $N_d$ is **smaller than** $n_i$, so we cannot use $n \approx N_d$. Use charge neutrality $n = N_d + p$ with $np = n_i^2$:
$$
\begin{aligned}
n^2 - N_d n - n_i^2 &= 0 \\
n &= \frac{N_d}{2} + \sqrt{\left(\frac{N_d}{2}\right)^2 + n_i^2} \\
&= 0.5\times10^{10} + \sqrt{(0.5\times10^{10})^2 + (1.45\times10^{10})^2} \\
&= 2.03\times10^{10}\ \text{cm}^{-3}
\end{aligned}
$$
Since $n = n_i \exp[(E_F - E_{Fi})/kT]$:
$$
E_F - E_{Fi} = kT\ln\frac{n}{n_i} = 0.02586\ln\frac{2.03\times10^{10}}{1.45\times10^{10}} = 0.0087\ \text{eV}
$$
The Fermi level is only about **8.7 meV above** $E_{Fi}$; such light doping makes the wafer almost intrinsic.

#### Part 2: Further doping with $N_a = 2\times10^{15}$ cm⁻³ boron
Now $N_a > N_d$, so the sample becomes **p-type** (compensated). Net acceptor concentration:
$$
N_a - N_d = 2\times10^{15} - 10^{10} \approx 2\times10^{15}\ \text{cm}^{-3} \gg n_i
$$
So $p \approx 2\times10^{15}$ cm⁻³ and $n = n_i^2/p \approx 1.05\times10^{5}$ cm⁻³.
$$
\begin{aligned}
E_{Fi} - E_F &= kT\ln\frac{p}{n_i} = 0.02586 \ln\frac{2\times10^{15}}{1.45\times10^{10}} \\
&= 0.02586 \times 11.83 = 0.306\ \text{eV}
\end{aligned}
$$

```text
 Ec ---------------------------
     EF (part 1) 0.0087 eV above Ei
 Ei - - - - - - - - - - - - - -
                 | 0.306 eV
 EF (part 2) ----+-------------
 Ev ---------------------------
```

**Answer:** With $10^{10}$ cm⁻³ Sb, $E_F$ is 0.0087 eV (8.7 meV) above $E_{Fi}$. After adding $2\times10^{15}$ cm⁻³ B, the sample is p-type and $E_F$ shifts to 0.306 eV **below** $E_{Fi}$, a total shift of about 0.315 eV.

Note: if the textbook version of this problem ($10^{16}$ Sb, then $2\times10^{17}$ B) is intended, the same method gives $E_F - E_{Fi} = 0.348$ eV, then $E_{Fi} - E_F = 0.424$ eV.

## Check yourself

The answer's key points as multiple-choice questions, with the correct option and why.

1. Why can n = Nd not be used for Nd = 10^10 cm^-3 Si?
   A. Antimony is not a donor
   B. Nd is too large
   C. Si is degenerate
   D. Nd is smaller than ni, so intrinsic carriers matter
   Answer: D. Nd < ni (1.45e10), so the full quadratic must be used. (Key point: Why n is not Nd)

2. Where is EF after doping with 10^10 Sb?
   A. About 8.7 meV above Efi
   B. About 0.35 eV above Efi
   C. At Efi exactly
   D. Below Efi
   Answer: A. n = 2.03e10 gives EF - Efi = kT ln(n/ni) = 0.0087 eV. (Key point: Fermi level, part 1)

3. What is the type after adding 2e15 boron?
   A. n-type
   B. p-type
   C. Intrinsic
   D. Degenerate n-type
   Answer: B. Na exceeds Nd, so the sample is compensated and p-type. (Key point: Type after boron)

4. Where is EF after boron doping?
   A. About 0.306 eV above Efi
   B. At mid-gap
   C. About 0.306 eV below Efi
   D. At Ev
   Answer: C. EFi - EF = kT ln(p/ni) = 0.02586 x ln(2e15/1.45e10) = 0.306 eV. (Key point: Fermi level, part 2)

## Close variants set in other exams

- [Fermi level with 10¹⁶ Sb then 2×10¹⁷ B](https://www.bctengineer.com/question.md?key=semester_3%2Felectrical_engineering_material%3Aantimony-1e16-boron-2e17) — Electrical Engineering Material, chapter 6, asked 6×
- [Fermi level with 10¹⁷ Sb then further doping](https://www.bctengineer.com/question.md?key=semester_3%2Felectrical_engineering_material%3Aantimony-1e17-fermi-shift) — Electrical Engineering Material, chapter 6, asked 6×
- [Fermi level with 10¹⁶ B then 10¹⁷ Sb](https://www.bctengineer.com/question.md?key=semester_3%2Felectrical_engineering_material%3Aboron-1e16-antimony-1e17) — Electrical Engineering Material, chapter 6, asked 5×
- [Fermi level of Si with 10¹⁶ Sb](https://www.bctengineer.com/question.md?key=semester_3%2Felectrical_engineering_material%3Aantimony-1e16-fermi) — Electrical Engineering Material, chapter 6, asked 5×

## Related in Electrical Engineering Material

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- [Resistance of Si cube doped with Sb](https://www.bctengineer.com/question.md?key=semester_3%2Felectrical_engineering_material%3Asi-cube-antimony) — Electrical Engineering Material, chapter 6
