---
title: "Top-down view for F = xz + yz'"
subject: "Embedded System"
chapter: 8
key: "semester_6/embedded_system:positive-photoresist-topdown-xz-yzbar"
source: https://www.bctengineer.com/q/semester_6/embedded_system/positive-photoresist-topdown-xz-yzbar
site: BCT Engineering
---

# Top-down view for F = xz + yz'

Embedded System · Chapter 8: IC Technology

- Asked in: 2075 Bhadra, 5+3 marks
- Answer checked by Claude Opus 5.5 (high effort) on 2026-10-14
- Page: https://www.bctengineer.com/q/semester_6/embedded_system/positive-photoresist-topdown-xz-yzbar
- Whole chapter: https://www.bctengineer.com/md/semester_6/embedded_system/chapter-8

## Question

Draw a top down view and schematic for the following function: F = xz + yz'. Describe with suitable diagram about positive photoresist used in photolithography.

## Short answer

F = xz + yz’ is built as F = NOT(G) where G = NOT(xz+yz’); pull-down: (x series z) || (y series z’), pull-up: (x||z) series (y||z’), 12 transistors. Positive photoresist dissolves where UV-exposed, so the developed pattern matches the mask clear areas; it provides high resolution.

## Answer

#### Schematic and top-down view of F = xz + yz'

Static CMOS gates are inverting, so F is made as F = NOT(G), where G = NOT(xz + yz'). One inverter produces z' and another produces F from G.

```text
 Pull-up (PMOS)              Pull-down (NMOS)
 VDD                                G
  |                            +----+----+
 (x || z)                      |         |
  |                            x         y
 (y || z')                     |         |
  |                            z         z'
  G                            |         |
                               +----+----+
                                    |
                                   GND
 z --[INV]-- z'
 G --[INV]-- F
```

Pull-down: (x in series with z) in parallel with (y in series with z'). Pull-up (the dual): (x parallel z) in series with (y parallel z'). In all, 12 transistors (inverter for z' = 2, gate = 8, output inverter = 2).

Simplified top-down (stick) view of the gate part:

```text
 VDD  =============================== metal
        |   |     |   |
      +-+---+-----+---+-+  p+ diffusion
      | x   z     y   z' |  poly gates run
      |  |   |     |   | |  vertically
      +-+---+-----+---+-+  across both rows
        |_______ G _______   metal output
      +-+---+-----+---+-+  n+ diffusion
        |   |     |   |
 GND  =============================== metal
```

Legend: the vertical poly lines x, z, y, z' cross the p+ row (top) and the n+ row (bottom); each crossing is a transistor. Metal joins the drain areas to the output G.

#### Positive photoresist

A positive photoresist is a light-sensitive polymer that becomes **soluble in the developer where it has been exposed to UV light**. The unexposed part remains and protects the layer below.

```text
 Exposure (UV through mask)      After development
   UV  UV      UV  UV             _____       _____
 [####]     [####]  mask         |resist|     |resist|
 ===resist===========            ===SiO2============
 ======SiO2==========            gap = window opened
 ======Si wafer=======
```

- The pattern on the wafer is the **same as the mask** (clear areas of the mask become openings).
- Advantages: better resolution, easier to remove, widely used for fine features.
- Example: Novolac resin with diazonaphthoquinone (DNQ) sensitiser.

## Check yourself

The answer's key points as multiple-choice questions, with the correct option and why.

1. What happens to a positive photoresist where it is exposed to UV light?
   A. It becomes soluble in the developer and is washed away
   B. It hardens and stays
   C. It turns into SiO2
   D. It becomes a conductor
   Answer: A. Exposed positive resist becomes soluble in developer; the unexposed part remains as protection. (Key point: Positive resist behaviour)

2. With a positive photoresist, how does the pattern on the wafer relate to the mask?
   A. It is the inverse of the mask
   B. It is the same as the mask, clear areas becoming openings
   C. It is unrelated to the mask
   D. It is mirrored and enlarged 5x
   Answer: B. Clear mask areas expose the resist, which dissolves, giving openings that match the mask. (Key point: Pattern polarity)

3. Why is F = xz + yz' built as NOT(G) with G = NOT(xz + yz')?
   A. PMOS transistors cannot be used in the pull-up
   B. Static CMOS gates are inverting, so an extra output inverter restores the function
   C. It reduces the transistor count to 8
   D. z' is not needed then
   Answer: B. A single static CMOS stage gives only an inverted function, so G is made first and then inverted. (Key point: Inverting CMOS gate)

4. What is the pull-down network for G = NOT(xz + yz')?
   A. (x parallel z) in series with (y parallel z')
   B. All four transistors in series
   C. (x series z) in parallel with (y series z')
   D. All four transistors in parallel
   Answer: C. AND terms become series chains in the NMOS network, ORed terms are in parallel. The pull-up is the dual. (Key point: Pull-down/pull-up structure)

## Related in Embedded System

- [IC manufacturing steps; top-down F = xz + y](https://www.bctengineer.com/question.md?key=semester_6%2Fembedded_system%3Aic-manufacturing-steps-topdown-xz-y) — Embedded System, chapter 8
- [Photolithography importance; BJT structure](https://www.bctengineer.com/question.md?key=semester_6%2Fembedded_system%3Aphotolithography-bjt-structure) — Embedded System, chapter 8

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