- 2069 Chaitra · 6 marks
Built-in potential from 1 Ω cm resistivity
Short answer
Hole mobility μp = 1400/3.1 = 451.6 cm²/V·s. Nd = 1/(ρ e μn) = 4.46×10^15 cm⁻³, Na = 1/(ρ e μp) = 1.38×10^16 cm⁻³. Built-in potential Vo = (kT/e) ln(Na Nd/ni²) = 0.02586 ln(5.59×10^11) ≈ 0.70 V.
Find the built-in potential for a p-n Si junction at room temperature if the bulk resistivity of Si is 1 Ω cm. Electron mobility in Si at room temperature is 1400 cm²V⁻¹s⁻¹; μn/μp = 3.1; ni = 1.05 × 10¹⁰ cm⁻³.
Assumption: both the p-side and the n-side have bulk resistivity cm, room temperature K, so V. In each extrinsic region the majority carriers alone decide the conductivity.
Step 1: Hole mobility
Step 2: Donor concentration on the n-side
, so
Step 3: Acceptor concentration on the p-side
Step 4: Built-in potential
Answer: cm⁻³, cm⁻³, built-in potential V.
The p-side needs about 3.1 times more dopant than the n-side for the same resistivity because holes are 3.1 times less mobile than electrons.
✓ Answer checked by Claude Opus 5.5 (high effort)
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