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Fermi level with 10¹⁶ Sb then 2×10¹⁷ B

Short answer

Initially EF – EFi = 0.02586 ln(10¹⁶/1.45×10¹⁰) = 0.348 eV above. After additional 2×10¹⁷ cm⁻³ boron, p = 1.9×10¹⁷ cm⁻³, EFi – EF = 0.02586 ln(p/ni) = 0.424 eV below.

An n type silicon wafer is uniformly doped with 10¹⁶ antimony atoms per cm³. Where will be the Fermi level compared to its intrinsic Fermi level? Where will Fermi level be shifted if the sample is further doped with 2×10¹⁷ boron atoms per cm³?

For a non-degenerate semiconductor, the Fermi level shift from the intrinsic level is

EF−EFi=kTln⁡nni (n-type),EFi−EF=kTln⁡pni (p-type)E_F - E_{Fi} = kT\ln\frac{n}{n_i} \ (\text{n-type}), \qquad E_{Fi} - E_F = kT\ln\frac{p}{n_i} \ (\text{p-type})

Assume: T=300T = 300 K, kT=0.02586kT = 0.02586 eV, ni=1.45×1010n_i = 1.45\times10^{10} cm−3^{-3}, full ionisation.

(a) Doped with 101610^{16} Sb cm−3^{-3}

Sb is a donor, so n=Nd=1016n = N_d = 10^{16} cm−3^{-3}.

EF−EFi=0.02586ln⁡10161.45×1010=0.02586×13.44=0.348 eV\begin{aligned} E_F - E_{Fi} &= 0.02586\ln\frac{10^{16}}{1.45\times10^{10}} \\ &= 0.02586\times13.44 = 0.348\ \text{eV} \end{aligned}

EFE_F is 0.348 eV above EFiE_{Fi}.

(b) Further doped with 2×10172\times10^{17} B cm−3^{-3}

B is an acceptor. Since Na>NdN_a > N_d, the sample becomes p-type:

p=Na−Nd=2×1017−1016=1.9×1017 cm−3EFi−EF=0.02586ln⁡1.9×10171.45×1010=0.02586×16.39=0.424 eV\begin{aligned} p &= N_a - N_d = 2\times10^{17} - 10^{16} = 1.9\times10^{17}\ \text{cm}^{-3} \\ E_{Fi} - E_F &= 0.02586\ln\frac{1.9\times10^{17}}{1.45\times10^{10}} \\ &= 0.02586\times16.39 = 0.424\ \text{eV} \end{aligned}

EFE_F is now 0.424 eV below EFiE_{Fi}; it has moved down by 0.348+0.424=0.7720.348 + 0.424 = 0.772 eV.

 Ec ---------------------------
     EF (a) ....  0.348 eV above
 Ei - - - - - - - - - - - - - -
     EF (b) ....  0.424 eV below
 Ev ---------------------------

Answer: (a) EF−EFi=+0.348E_F - E_{Fi} = +0.348 eV; (b) EF−EFi=−0.424E_F - E_{Fi} = -0.424 eV (p-type).

✓ Answer checked by Claude Opus 5.5 (high effort)

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