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n-type carrier concentration versus temperature

Short answer

At low temperature, carrier concentration rises exponentially as donors ionise with slope -ΔE/(2k). In the saturation (extrinsic) region, n ≈ Nd and is nearly constant. At high temperature, intrinsic generation dominates, and n rises steeply with slope -Eg/(2k).

Explain how carrier concentration of an n-type extrinsic semiconductor depends on temperature with necessary diagram and graphs.

In an n-type semiconductor (donor concentration NdN_d, donor level ΔE=Ec−Ed\Delta E = E_c - E_d below the conduction band), the electron concentration changes with temperature through three distinct regions. A plot of ln⁡n\ln n against 1/T1/T shows them clearly.

 ln n
   |\
   | \  intrinsic
   |  \  slope -Eg/2k
   |   \
   |    \__________________  n = Nd
   |         extrinsic      \
   |                         \  ionisation
   |                          \  slope -ΔE/2k
   +----|------------------|------------ 1/T
      1/Ti               1/Ts
   (high T at left, low T at right)
  n
    |                          /
    |                         /  intrinsic
    |        ________________/
 Nd |      /   extrinsic (n = Nd)
    |     /
    |    / ionisation
    |___/________________________ T
       ~100K   Ts         Ti (~500K for Si)

1. Ionisation (freeze-out) region: low T

At very low TT, electrons are bound to donors. As TT rises, donors ionise:

n=(12NcNd)1/2exp⁡(−ΔE2kT)n = \left(\frac{1}{2}N_cN_d\right)^{1/2}\exp\left(-\frac{\Delta E}{2kT}\right)

Slope of ln⁡n\ln n vs 1/T1/T is −ΔE/2k-\Delta E/2k. EFE_F lies between EdE_d and EcE_c.

2. Extrinsic (saturation) region: medium T

Above TsT_s almost all donors are ionised, and intrinsic generation is still small:

n≈Ndn \approx N_d

The concentration stays nearly constant. EF=Ec−kTln⁡(Nc/Nd)E_F = E_c - kT\ln(N_c/N_d) moves slowly towards mid-gap. Devices are designed to operate here (about 150 K to 450 K for Si with Nd=1015N_d = 10^{15} cm−3^{-3}).

3. Intrinsic region: high T

Above TiT_i, electrons excited across the band gap outnumber those from donors:

n≈ni=NcNvexp⁡(−Eg2kT)n \approx n_i = \sqrt{N_cN_v}\exp\left(-\frac{E_g}{2kT}\right)

Slope is −Eg/2k-E_g/2k, much steeper. EFE_F approaches EFiE_{Fi} (mid-gap) and n≈pn \approx p; the material loses its n-type character.

Fermi level vs temperature

  E
 Ec |-------------------------
    | EF near Ed
    |   \_
    |     `-._
 Ei |---------`-.__________ (EF -> Ei)
    |
 Ev |-------------------------  T

Summary: nn rises exponentially, flattens at NdN_d, then rises again exponentially at high TT. TiT_i increases with doping and with band gap.

✓ Answer checked by Claude Opus 5.5 (high effort)

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